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Toplam kayıt 4, listelenen: 1-4
Effects of Thermal Annealing and Film Thickness on the Structural and Morphological Properties of Titanium Dioxide Films
(Polish Acad Sciences Inst Physics, 2012)
Titanium dioxide (TiO2) thin films having different thicknesses of 220, 260, and 300 nm were deposited onto well-cleaned n-type silicon substrates by reactive DC magnetron sputtering and annealed in the range of 200-1000 ...
Electrical characteristics of Au/n-GaAs structures with thin and thick SiO2 dielectric layer
(Pleiades Publishing Inc, 2011)
The aim of this study, to explain effects of the SiO2 insulator layer thickness on the electrical properties of Au/n-GaAs Shottky barrier diodes (SBDs). Thin (60 ) and thick (250 ) SiO2 insulator layers were deposited on ...
Structural investigation and electronic band transitions of nanostructured TiO2 thin films
(Wiley-V C H Verlag Gmbh, 2011)
Titanium dioxide (TiO2) thin film was deposited on n-Si (100) substrate by reactive DC magnetron sputtering system at 250 degrees C temperature. The deposited film was thermally treated for 3 h in the range of 400-1000 ...
Microstructural properties of InGaN/GaN light-emitting diode structures with different In content grown by MOCVD
(Springer, 2014)
The structural and morphological properties of metal-organic chemical vapor deposition (MOCVD)-grown InGaN/GaN light-emitting diode (LED) structures with different In content have been studied by high-resolution X-ray ...